ProtoLaser LDI and Electron Beam Lithography – EBL
Manufacturer: LPKF Laser & Elektronika d.o.o.
Year: 2011
Financed from EU (ESRD) founds from the operation Center of Excellence in Nanoscience and Nanotechnology – CENN Nanocenter 2010 – 2013.
Lithography is the process where we illuminate a substrate coated with a photosensitive polymer (resist). When resist is selectively exposed to radiation it changes its physical properties and this change allows us to form structures.
E-beam lithography enables us to illuminate structures with a resolution of a few nanometers and laser lithography with a resolution of 1 μm. We can produce nano and microstructures of any shape and patterns on flat surfaces. Lithography is used for: prototyping, electronics, microfluidics, optics, Lab-on-chip and much more. Minimum feature sizes depend on the employed method, choice of resist, and resist thickness. Versatile substrate materials: silicon, GaAs, glass, sapphire ceramics, polymers…
DaLI is a high resolution laser lithography system for rapid prototyping on resist-coated substrates. The platform is based on a continuous UV laser, 2D acousto-optical deflectors and a high-precision xy table allowing direct optical nanolithography with a resolution of 1µm in a 10x10cm area. Fast writing is possible due to 100 kHz beam positioning with acoustic-optical deflectors.
